Attracting plate of an electrostatic chuck for semiconductor manufacturing



FIG. 1 is a front elevational view of an attracting plate of an electrostatic chuck for semiconductor manufacturing, showing our new design;

FIG. 2 is a rear elevational view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is an enlarged view thereof taken along sections A—A and B—B in FIG. 1;

FIG. 5 is a right side elevational view thereof;

FIG. 6 is a left side elevational view thereof;

FIG. 7 is a cross-sectional view taken along line 7—7 in FIG. 4 with portions of the internal mechanism omitted; and,

FIG. 8 is a front perspective view thereof.

The broken line showing in the figures is for illustrative purposes only and forms no part of the claimed design. 

The ornamental design for an attracting plate of an electrostatic chuck for semiconductor manufacturing, as shown and described. 